Superior Processing with Megasonic Technology
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Our Products can remove particles < 20 nm to > 10 µm
With ProSys megasonic systems and technology you can:
- Clean contamination-sensitive products quickly, safely and effectively and improve PRE
- Increase the kinetics for processes that depend on chemical reactions
- Capture real-time data that identifies process improvement opportunities and predicts preventative maintenance
- Reduce process cycle time for cleaning and reaction kinetics
Single Wafer
Typical applications
Batch
Typical applications
